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This product "Wet Etch machine" is wet etch equipment for next generation above G6. It is used in Cu, AL, ITO, IGZO process. The design of product is coupled with the chemical spray system, to satisfy the customer process capability.
This product has the characteristics of high equipment Up time, low substrate output Tact time, good etching Uniformity, low chemical and DI water consumption. It can provide energy saving and carbon reduction.
The Product Features and Innovative Technology
(1) Low substrate breakage rate：
1.Without double roller transfer system
2.Guide roller with side support
3.High collimation Dry AK
(2) High equipment up time：
1.Auto anti-crystal clean function
2.Auto chemical tank exchange function
3.Auto dual filter exchange function
4.Semi-auto chemical piping clean function
5.Equipment failure monitor system:IDMS
(3) Energy conservation：
1.Reduce chemical of substrate carry-out
2.Reduce DIW waste of substrate clean
3.Reduce chemical of exhaust by auto-damper
